Chris A. Mack's Field Guide to Optical Lithography PDF

By Chris A. Mack

ISBN-10: 0819462071

ISBN-13: 9780819462077

The fabric during this box advisor is a distillation of fabric prepare via Chris Mack during the last twenty years, together with notes from his graduate-level lithography path on the collage of Texas at Austin. This box advisor information the lithography strategy, photo formation, imaging onto a photoresist, photoresist chemistry, and lithography regulate and optimization. An creation to next-generation lithographic applied sciences is usually incorporated, in addition to an intensive lithography thesaurus and a summation of salient equations severe to an individual all in favour of the lithography industry.

Contents

- image word list
- The Lithgraphy approach
- photograph Formation
- Imaging right into a Photoresist
- Photoresist Chemistry
- Lithography keep watch over and Optimization
- Equation precis
- word list
- Index

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Additional resources for Field Guide to Optical Lithography

Sample text

The transmission and reflection coefficients are functions of the angle of incidence and the polarization of the incident light. If θi is the incident (and reflected) angle and θt is the transmitted angle, then the electric field reflection and transmission coefficients are given by the Fresnel formulae. n1 cos(θi ) − n2 cos(θt ) 2n1 cos(θi ) ρ12⊥ = τ12⊥ = n1 cos(θi ) + n2 cos(θt ) n1 cos(θi ) + n2 cos(θt ) ρ12 = n1 cos(θt ) − n2 cos(θi ) n1 cos(θt ) + n2 cos(θi ) τ12 = 2n1 cos(θi ) n1 cos(θt ) + n2 cos(θi ) where nj = nj + iκj = the complex index of refraction of material j.

44 Optical Lithography Measuring the Dill ABC Parameters The photoresist to be measured is coated on a non-reflecting transparent substrate. The resist is then exposed by a normally incident parallel beam of light at the wavelength of measurement. At the same time, the intensity of the light transmitted through the substrate is measured continuously. The output of the experiment, transmitted intensity as a function of exposure time, is then analyzed to determine the resist ABC parameters. Note that the effectiveness of this measurement technique rests with the nonzero value of A.

Coherent illumination means simply that the light striking the mask arrives from only one direction. Generally it is assumed that coherent illumination on the mask is normally incident. The result is a diffraction pattern that is centered in the entrance to the objective lens. What would happen if we changed the direction of the illumination so that the light struck the mask at some angle θ ? The effect is simply to shift the position of the diffraction pattern with respect to the lens aperture [in terms of spatial frequency, the amount shifted is (sin θ )/λ].

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Field Guide to Optical Lithography by Chris A. Mack


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